M03700 - SEMI M37 - Test Method for Measuring Etch Pit Density (EPD) in Low Dislocation Density Indium Phosphide Wafers StdPbc-1020 This Document provides a guide

This Document provides a guide to the test method to evaluate filter elements used in UPW fluid streams

• オプションB：　アクティブ搬送がキャリアをストッカー外部位置に移送する。

and other detail appropriate for the model of an equipments structure as viewed by a factory host application through the available communication interfaces

SEMI HB4-0913 (first published)

but controlled

M03700 - SEMI M37 - Test Method for Measuring Etch Pit Density (EPD) in Low Dislocation Density Indium Phosphide Wafers StdPbc-1020 This Document provides a guideThis test method was technically approved by the global Compound Semiconductor Committee and is the direct responsibility of the Japanese Compound Semiconductor Materials Committee. Current edition approved by the Japanese Regional Standards Committee on March 17, 1999. Initially available at www. semi. org April 1999; to be published June 1999. This document provides a method to measure etch pit density (EPD) in low dislocation density InP wafers.